Awards include the coveted
iF Design Award bestowed by the International Design Forum (iF) in Hannover,
Germany, and the Innovative Product of the Year Award presented by the Oregon
Tech Awards in the United States.

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The first Titan S/TEMs were installed in the second half of 2005.

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de . "Using proximity X-ray lithography, multiple zone plates
can be written concurrently in a single field, and our patented
stepper enables many fields to be printed on a single substrate.

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Known throughout the world as one of the most prestigious distinctions for
manufacturers, the iF Product Design Award is presented in recognition of
superior product design.

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The new platform also holds promise
for the growing number of advanced application in NanoBiology and
pharmaceutical development.S. JMAR Technologies, Inc.

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Scholes, FEI's vice president who led FEI's TEM
business. Its
performance and flexibility are designed to meet the ultra-high resolution
requirements for our customers working in NanoResearch and Industry, and
NanoElectronics for many years to come. Government's Defense Microelectronics
Activity (DMEA) semiconductor fabrication facility.

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, Within months of its release,
FEI's Titan(TM) scanning transmission electron microscope (S/TEM), the world's
most powerful, commercially-available microscope, has earned four prestigious
awards for its design, performance and innovation.

About FEI
FEI's Tools for Nanotech (TM), featuring focused ion- and electron-beam
technologies, deliver 3D characterization, analysis and modification
capabilities with resolution down to the sub-Angstrom level.
(Nasdaq: JMAR) has been issued a patent (US 6,845,145 B2) for advanced
X-ray lithography stepper technology that will enable a faster, more
cost-effective means of producing state-of-the-art zone plate optics
for its Compact X-ray Microscope and X-ray Nano Probe product lines. The Company is leveraging over a decade of laser and
photonics research to develop a diverse portfolio of products with
commercial applications in rapidly growing industries while continuing
to provide support for the U.

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With R+D centers
in North America and Europe and sales and service operations in more than 40
countries around the world , FEI is bringing the nanoscale within the grasp of
leading researchers and manufacturers and helping to turn some of the biggest
ideas of this century into reality.
The combination of JMAR's soft X-ray source and its newly patented
stepper creates a unique tool for fabrication of the zone plate
diffractive optics used to collect and focus X-rays - a process
critical to the development of JMAR's X-ray Microscope and X-ray Nano
Probe products. Electron beam equipment is
presently used for this application in spite of the high cost, because
this requirement cannot be met with conventional optical lithography,"
said Bob Selzer, Senior VP for Technology and one of the patent
inventors . The product
also offers research scientists and manufacturing engineers a
versatile laser source that can be used for a multitude of
applications, including spectro-chemical analysis, nanotech scale
fabrication, microscopy and soft X-ray source generation.
This news release contains certain "forward-looking statements.

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Like the IDEA (Industrial Design Excellence Awards)
in the United States , the iF awards represent the best product design in
Europe.
JMAR's new patent addresses a critical interface between source and
stepper, creating a cost advantage in the zone plate manufacturing
process that JMAR plans to leverage in its new products.

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FEI's Titan(TM) S/TEM Receives Industry Honors

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Additional installations are currently underway around the world and FEI is
increasing production to keep up with demand. More information can be found on the FEI
Web site at: http://www.

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The Titan S/TEM was also selected by
editorial boards as one of the Top Products of 2005 by Solid State Technology
magazine and one of the Greatest Hits of 2005 by MICRO magazine.
"We are extremely honored to receive these recognitions from the
industry," said George D.

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The zone plate optical elements used in JMAR's new
product lines require concentric ring spacing in the sub-100 nanometer
range and are currently written using electron beam (eBeam)
lithography systems - a time-consuming and costly method, since the
thousands of concentric rings comprising the zone plate are written
one ring at a time. Walrod, President and Chief Executive Officer of JMAR.

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ifdesign. Using the X-ray lithography stepper technology
described in the new patent, JMAR plans to write these concentric
rings concurrently - resulting in more efficient, economical and
consistent production."
The zone plate work by JMAR Systems Division is made possible
under a DARPA and NAVAIR contract. Given these risks and
uncertainties , investors are cautioned not to place undue reliance on
such forward-looking statements and no assurances can be given that
such statements will be achieved.

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"The Titan's sub-Angstrom resolution, high stability , reliability
and overall ease-of-use have set a new standard for aberration-corrected S/TEM
imaging , and customer reaction to the Titan has been very favorable.feicompany.com .

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iF is
committed to supporting the cause of industrial design and raising awareness
among industrial decision-makers on the crucial impact that design can have on
successful product marketing. JMAR is targeting
the nanotech, bioscience and semiconductor industries with its
Britelight(TM) Laser; Compact X-ray Light Source; X-ray Microscope -
for 3D visualization of single cells and polymers- and its X-ray Nano
Probe - enabling interaction, analysis and modification at the
nano-scale. Actual results could differ materially
from these forward-looking statements as a result of a number of
factors, including the failure of new product technology to perform as
predicted, competition from alternative technologies , uncertainties as
to the size of the market, cost and margins, failure to obtain market
acceptance , current or future government regulations affecting the use
of JMAR's products, the lack of availability of critical components,
the degree of protection from future patents, and other risks
associated with the development or acquisition of new products or
technologies and those risks detailed in the Company's 2003 Form 10-K
and third quarter Form 10-Q filed with the SEC.

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World's Most Advanced Commercial Electron Microscope Impresses Both Industry
Experts and Customers

HILLSBORO, Ore."
The Titan microscope enables deep sub-Angstrom resolution making way for
the highest performance available in both transmission electron microscopy
(TEM) and scanning transmission electron microscopy (STEM) modes. does not
assume any duty to publicly update or revise the material contained
herein.

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Winning products are selected from more than 2000 entrants in more
than 30 countries and are judged on several levels, including design quality,
material compatibility , innovation, environmental consideration, convenience,
stability and durability.

Business Editors/Technology Writers

SAN DIEGO----JMAR Technologies, Inc.

About JMAR

JMAR Technologies, Inc.

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The industrial design of the Titan S/TEM was
developed for FEI by Philips Design .

About the iF Design Awards
The iF Design Awards, which were established in 1954, are supervised by
the International Design Forum (iF) in Hannover, Germany.
"Although the patented invention was originally conceived as a
method for producing compound semiconductor devices, it also meets the
special needs of zone plate fabrication - printing high aspect ratio
structures to sub -50nm resolution."
Forward-looking statements are based on current expectations and
assumptions and are inherently subject to risks and uncertainties,
some of which cannot be predicted or quantified , and many of which are
beyond the Company's control.


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kunkel microstructural

"
"Our new stepper patent caps a series of developments that improve
our readiness to manufacture advanced nanotechnology instruments ,"
said Ronald A.

About Britelight(TM)

JMAR's Britelight(TM) Modular Solid State Laser System provides a
unique combination of high brightness, short pulse duration, and
exceptional beam quality in a modular, compact design.

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For additional information on the iF awards,
please visit http://www.

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iF has acquired an
international reputation as a leading industrial design institution .

JMAR Granted X-Ray Lithography Patent; Proprietary Technology Enables Low-Cost in-House Manufacturing of Key Component for Line of Soft X-ray Instruments


"Recent advancements in our Britelight(TM ) laser- driven X-ray source
have expanded its utility beyond X-ray lithography to include
illumination for X-ray microscopy and nano-scale chemical analysis. is a leading innovator in the development
of laser-based equipment for imaging, analysis and fabrication at the
nano-scale.

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The import
of ultra-high resolution imaging continues to grow as advanced research work
continues deep into the nanoscale, semiconductor manufacturers push beyond the
45 nm node for design and manufacturing, and government regulatory agencies
around the world see a growing need to characterize the smallest of
nano-particles.


JMAR also is developing its BioSentry(TM) realtime,
continuous water monitoring system and maintains a strategic alliance
for the development of READ - biological and chemical sensors for
homeland security, environmental and utility infrastructure
industries.

bsed lucis

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